30 J cm2 at 532 nm Addresses any electrostatic discharge (ESD) concerns"> 30 J cm2 at 532 nm Addresses any electrostatic discharge (ESD) concerns"> 30 J cm2 at 532 nm Addresses any electrostatic discharge (ESD) concerns"> T-NB1-J11 - Ø1" Kr-Ion Laser Mirror, 520-647 nm, 45° AOI product series_afl tool kits 59 mm Parallelism <3 arcmin – www.je-nyc.com
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T-NB1-J11 - Ø1" Kr-Ion Laser Mirror, 520-647 nm, 45° AOI product series_afl tool kits 59 mm Parallelism <3 arcmin

SKU: 63467496387
4.6
USD125.00 USD145.00

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Ships within 48 hours · Estimated delivery Nov 16 - Nov 21

Description

T NB1 J11 Ø1" Kr Ion Laser Mirror, 520 647 nm, 45° AOI product series_afl tool kits 59 mm Parallelism <3 arcmin 59 mm Parallelism <3 arcmin Surface Quality 10 5 Scratch Dig Transmitted Wavefont Error <λ 10 at 633 nm Material UV Fused Silica Damage Threshold >30 J cm2 at 532 nm Addresses any electrostatic discharge (ESD) concerns

Exchange/Return Notes
  • We offer a 30-day return/exchange service after receiving.
  • Final sale items are not eligible for returns or exchanges.
  • To process your return/exchange, please contact us at [email protected]
  • Please click here for more details>>> Return & Exchange Policy

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